Название: Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology, Volume 2, 3rd Edition
Автор: Luciano Lavagno, Grant Martin, Igor L. Markov, Louis K. Scheffer
Издательство: CRC Press
Год: 2026
Страниц: 799
Язык: английский
Формат: True PDF, True EPUB
Размер: 103.5 MB

Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology, the second of two volumes in the Electronic Design Automation for Integrated Circuits Handbook, Third Edition, thoroughly examines real‑time logic (RTL) to GDSII generation, analog/mixed‑signal design, physical verification, and technology computer‑aided design (TCAD). Chapters contributed by leading experts authoritatively discuss design for manufacturability (DFM) at the nanoscale, power supply network design and analysis, design modeling, and much more.

A modern electronic design automation (EDA) flow starts with a high-level description of the design in a register-transfer level (RTL) language, such as Verilog or VHDL, reducing design work by abstracting circuit implementation issues. Automated tools synthesize the RTL to logic gates from a standard-cell library along with custom-designed macro cells (e.g., memories), place the logic gates on a floorplan, and route the wires connecting them. The layout of the various diffusion, polysilicon, and metal layers composing the circuitry is streamed out to the Gdsii database format for fabrication. Some designers use high-level synthesis (HLS) to produce RTL from a high-level specification that is in C, C++, or SystemC. This speeds up circuit design and can help with faster architectural exploration. However, HLS is still a relatively small portion of the IC design market, due to lower quality results.

New to This Edition:

Major updates appearing in the initial phases of the design flow, where the level of abstraction keeps rising to support more functionality with lower non‑recurring engineering (NRE) costs
Significant revisions reflected in the final phases of the design flow, where the complexity due to smaller and smaller geometries is compounded by the slow progress of shorter wavelength lithography
New coverage of cutting‑edge applications and approaches realized in the decade since the publication of the second edition—these are illustrated by updates including the impact of new analog layout methods, chiplet integration, and power‑optimized design, in various chapters

Offering improved depth and modernity, this book provides a valuable, state‑of‑the‑art reference for electronic design automation (EDA) students, researchers, and professionals.

Contents: